Ultra High Vacuum Evaporator UE Series
Compact multi-source deposition system
This is a multi-source deposition system that can deposit trace amounts of metals or organic materials onto the surface of samples in ultra-high vacuum. Optional features such as shutters and film thickness measurement can be added. <Features> - A compact and cost-effective crucible-type ternary or quaternary deposition source - Two models available: a multi-source high-temperature evaporator (temperature range 700°C to 1700°C) UE-103C/104C series and a multi-source evaporator (temperature range 150°C to 800°C) UE-203C/204C series - Optional shutter addition and film thickness measurement functionality <Applications> Deposition of trace amounts of metals or organic materials onto the surface of target samples in ultra-high vacuum.
